Скачать
Part 2 - Perspectives: eBeam Initiative Luminaries Panel Discussion (Two-Part Video)
Автор: eBeam Initiative
Загружено: 2024-10-28
Просмотров: 104
Описание: Glen Scheid of Micron, Harry Levinson of HJL Lithography, and Naoya Hayashi of DNP (pictured left to right) debate the results of this year’s Luminaries Survey in a panel at the eBeam Initiative annual reception during SPIE PUV with Aki Fujimura as moderator. In Part 1, the panelists cover the state of the mask industry, growing equipment investments, actinic inspection, high-NA EUV broad adoption and the future of 6x12-inch masks. Part 2 covers mask writer costs, EUV pellicles, curvilinear ILT and the extendibility of 193i.
Не удается загрузить Youtube-плеер. Проверьте блокировку Youtube в вашей сети.
Повторяем попытку...
Повторяем попытку...
Доступные форматы для скачивания:
Скачать видео
-
Информация по загрузке:
