Tech Talk: Micron Demonstrates PLDC-MPC Correction Results
Автор: eBeam Initiative
Загружено: 2025-06-03
Просмотров: 482
Описание: Paris Spinelli of Micron demonstrates how PLDC improves both mask linearity and uniformity with no increase in turnaround time for all types of photomasks in an extended version of his oral presentation at the PMJ finale – a collaboration between Micron, NuFlare and D2S, which won the Best Paper Award at PMJ.
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