China Built This Super Horror Machine! Impossible EUV Chip Making Machine
Автор: Mr.Factor
Загружено: 2026-01-11
Просмотров: 725
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China has recently made notable progress toward developing its own EUV (extreme ultraviolet) lithography machine, a technology that is essential for manufacturing the most advanced semiconductor chips. EUV machines are extremely complex and, until now, have been commercially produced only by ASML in the Netherlands. Because China is blocked from buying these machines due to export controls, it has been trying to build its own version.
According to recent reports, Chinese researchers working in highly secure facilities have built and tested an early EUV prototype. This prototype has reportedly succeeded in generating EUV light, which is one of the hardest technical challenges in the entire system. This achievement suggests that China has crossed an important scientific threshold, even though the machine is still experimental.
However, this does not mean China has a production-ready EUV machine. Commercial EUV tools must run reliably 24/7, pattern wafers at very high speed, and achieve extreme precision. Areas such as high-throughput operation, ultra-precise optics, defect control, and long-term stability are still major hurdles. China’s current system is believed to be large, slow, and suitable mainly for laboratory testing rather than real chip manufacturing.
The project is often described as a Manhattan Project style effort, involving heavy state funding, secrecy, and the recruitment of top domestic and overseas talent. The goal is long-term technological independence rather than an immediate replacement for ASML’s machines.
Most analysts believe that it will take several more years before China can turn this prototype into a reliable industrial tool—if it succeeds at all. Some optimistic Chinese estimates mention the late 2020s, while outside experts remain cautious and stress that EUV mastery is one of the hardest engineering challenges in modern industry.
China has made real progress, but it has not yet “caught up”. The development is important symbolically and strategically, but ASML still maintains a significant technological lead in commercial EUV lithography.
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