UIUC MRL March RIE traning video
Автор: MRL Facilities
Загружено: 2022-02-25
Просмотров: 227
Описание:
March CS-1701 reactive ion etcher is a bench-top system with water cooled RF platen.
It is capable of etching photoresist, polymer and graphene.
This system could be operated under manual mode or auto mode.
Features:
400W, 13.56 MHz RF Generator with Automatic Matching Network
Delivers Excellent Process Repeatability.
Two MFC gas flow channels: O2 and CF4.
The March RIE 1/2 chamber is configured with a 7”/5” powered electrode to accommodate a wide range of wafer sizes.
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