Unveiling High NA EUV | ASML
Автор: ASML
Загружено: 2024-06-05
Просмотров: 360443
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Step into the future of advanced chipmaking with our High NA EUV platform: the TWINSCAN EXE. Committed to keep powering technology forward, together with our ecosystem, we're innovating lithography to improve the performance, functionality and energy efficiency of tomorrow's chip technology.
Featuring advanced anamorphic optics and significantly faster stages, the TWINSCAN EXE platform supports 8-nanometer resolution and improves imaging contrast by 40% (compared to NXE), while delivering high productivity, lower costs and fewer defects in chip manufacturing. The EXE sets new benchmarks for transistor density and chip performance to enable multiple future nodes in logic and memory.
Learn more about High NA EUV:
https://www.asml.com/en/news/stories/...
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