what are the sputtering targets
Автор: RSM Sputtering Target
Загружено: 2025-10-10
Просмотров: 26
Описание: Sputtering targets are critical materials used in physical vapor deposition (PVD) processes for the fabrication of electronic thin films. Sputtering, a primary thin-film deposition technique and a type of PVD, involves bombarding the target material (the sputtering target) with ions inside a PVD chamber. This bombardment causes metal atoms from the target to be ejected with controlled energy, subsequently depositing onto a wafer surface to form a metallic thin film through sputter coating.
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