China's EUV Lithography Breakthrough ASML Monopoly Shattered Is Tech Denial Dead

Описание: "Connecting the Dots of History and Mystery"
China has secretly completed a real EUV lithography prototype in Shenzhen, generating actual EUV light and breaking ASML's monopoly. This Reuters investigation reveals how US sanctions backfired, forcing China's "total mobilization" Manhattan Project-style effort. Former ASML engineers, Huawei coordination, and high-security facilities enabled breakthrough experts said was "10 to 15 years away." Analysis covers Jensen Huang's warnings, "good enough" strategy for military AI, and why technological denial may be obsolete. Perfect for tech watchers, geopolitics followers, and semiconductor industry analysts tracking the end of Western chip supremacy.

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